masking pattern meaning in Chinese

掩模图案

Some practical examples for producing mask patterns of micro - lens array are given in the end
最后给出生成微透镜列阵掩模图形的实例。
When the two layers of sio2 with different refractive index are finished , the designed mask pattern is printed on the film by photolithography . after that , icp is performed for dry etching , then , the waveguide structures are obtained . at present , the rudimental graph of edg has been obtained
两层不同折射率的sio _ 2薄膜制备好之后，经过光刻、等离子体刻蚀( icp )的工艺步骤之后，形成了波导结构，初步制作出了器件的图形。
The processes include the deposition of the waveguide film , the design and fabrication of the mask pattern , the lithography , the metal coating with a magnetic sputtering , the lift - off process for the metal mask , the dry deep etching by icp , the slicing of the wafer , the polishing of the cutting edge , the fiber - to - waveguide alignment and at last , the performance testing . some edg chip samples are fabricated
对设计好的集成波导器件，本论文设计并试验了器件的制作的全部工艺，包括波导薄膜的沉积，掩模的设计制作，光刻，溅射金属薄膜，剥离法制作金属掩模，干法深刻蚀，硅片切割，端面磨抛，波导对准和性能测试。